급속 열처리시 실리콘 웨이퍼에 발생하는 슬립 현상의 해석Analysis of thermal stress-induced slip in silicon wafer during rapid thermal processing

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 814
  • Download : 0
Advisors
엄윤용researcherEarmme, Youn-Youngresearcher
Description
한국과학기술원 : 기계공학과,
Publisher
한국과학기술원
Issue Date
1990
Identifier
67479/325007 / 000881386
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 기계공학과, 1990.2, [ v, 46 p. ]

URI
http://hdl.handle.net/10203/46940
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=67479&flag=dissertation
Appears in Collection
ME-Theses_Master(석사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0