CMOS IMAGE SENSOR씨모스 이미지 센서

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Disclosed is a CMOS image sensor, comprising a photodiode formed in a substrate, a floating diffusion region formed in the substrate in a manner such that it is distanced from the photodiode surrounds the photodiode and a transfer gate formed in a manner such that it is distanced from the photodiode and the floating diffusion region and formed in a boundary area between the photodiode and the floating diffusion region, thereby overlapping the photodiode and the floating diffusion region.
Assignee
KAIST
Country
CC (Cocos (Keeling) Islands)
Application Date
2006-06-23
Application Number
200610090020.8
Registration Date
2009-09-02
Registration Number
100536152
URI
http://hdl.handle.net/10203/303581
Appears in Collection
EE-Patent(특허)
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