Demonstration of High Ferroelectricity (P-r similar to 29 mu C/cm(2)) in Zr Rich HfxZr1-xO2 Films

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In this letter, we report excellent ferroelectricity with high remanent polarization (P-r) in Zr rich hafnium zirconium oxide (HZO) films using high pressure postmetallization annealing (HPPMA). HZO films annealed using rapid thermal annealing (RTA) show highest ferroelectricity when the Hf:Zr ratio is 1:1 and exhibit antiferroelectricproperty for Zr rich films. However, under HPPMA, Zr rich films demonstrate enhanced ferroelectric property as compared to 1:1 HZO films and the best result was observed for 1:3 HZO films. The HZO (1:3) films by HPPMA show P-r as high as similar to 29 mu C/cm(2), which is almost 50% higher than that achieved for the best condition of RTA (P-r similar to 19 mu C/cm(2)). Besides, due to the presence of high Zr, the HZO (1: 3) films by HPPMA exhibit considerably higher dielectric constant (k similar to 43) and low coercive field (E-c similar to 1.21 MV/cm) as compared to that of HZO (1:1) films by RTA (k similar to 37, E-c similar to 1.35 MV/cm). We believe the enhanced ferroelectricity in Zr rich HZO films can be due to more o/t-phase formation in ZrO2 under HPPMA as compared to that of RTA. On the other hand, more m-phase formation was observed in HfO2 under HPPMA, resulting in a significant drop of Pr in case of Hf rich HZO. The demonstration of enhanced ferroelectric properties by Zr rich HZO films can be helpful for high functional semiconductor device applications.
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Issue Date
2020-01
Language
English
Article Type
Article
Citation

IEEE ELECTRON DEVICE LETTERS, v.41, no.1, pp.34 - 37

ISSN
0741-3106
DOI
10.1109/LED.2019.2955198
URI
http://hdl.handle.net/10203/272118
Appears in Collection
EE-Journal Papers(저널논문)
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