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NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN Chun , Soung Soon, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.1, pp.31 - 35, 1989-01 | |
The Effect of Reactant Gases Composition on The PECVD of TiN Chun , Soung Soon, THIN SOLID FILMS, v.169, no.1, pp.57 - 68, 1989 | |
LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BLANKET TUNGSTEN USING A GASEOUS MIXTURE OF WF6, SIH4, AND H2 PARK, HL; YOON, SS; Park, Chong-Ook; Chun , Soung Soon, THIN SOLID FILMS, v.181, no.1, pp.85 - 93, 1989-12 | |
Dependence of oxygen redistribution on titanium film thickness during titanium silicide formation by rapid thermal annealing Kang, S.W.; Park, Sin Chong; Chun , Soung Soon, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.6, pp.3246 - 3250, 1989-11 |
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