The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN
- Publisher
- A V S Amer Inst Physics
- Issue Date
- 1989-01
- Language
- English
- Article Type
- Article
- Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.1, pp.31 - 35
- ISSN
- 0734-2101
- Appears in Collection
- RIMS Journal Papers
- Files in This Item
- There are no files associated with this item.
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