The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN

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Publisher
A V S Amer Inst Physics
Issue Date
1989-01
Language
English
Article Type
Article
Citation

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.1, pp.31 - 35

ISSN
0734-2101
DOI
10.1116/1.1315821
URI
http://hdl.handle.net/10203/56555
Appears in Collection
RIMS Journal Papers
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