Vertically Oriented, Three-Dimensionally Tapered Deep-Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography
- Publisher
- WILEY-V C H VERLAG GMBH
- Issue Date
- 2014-11
- Language
- English
- Article Type
- Article
- Keywords
NEAR-FIELD; OPTICAL INTERFERENCE; PLASMONIC MATERIALS; NANOGAP ARRAYS; WAVE-GUIDE; LIGHT; MODES; METAMATERIALS; ILLUMINATION; RESOLUTION
- Citation
ADVANCED MATERIALS, v.26, no.44, pp.7521 - 7528
- ISSN
- 0935-9648
- Appears in Collection
- CBE-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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