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College of Engineering(공과대학)Dept. of Chemical and Biomolecular Engineering(생명화학공학과)CBE-Journal Papers(저널논문)

Vertically Oriented, Three-Dimensionally Tapered Deep-Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography

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dc.contributor.authorLee, Sol-Ahko
dc.contributor.authorKang, Hong-Sukko
dc.contributor.authorPark, Jung-Kiko
dc.contributor.authorLee, Seungwooko
dc.date.accessioned2015-04-07T04:22:48Z-
dc.date.available2015-04-07T04:22:48Z-
dc.date.created2014-12-29-
dc.date.created2014-12-29-
dc.date.issued2014-11-
dc.identifier.citationADVANCED MATERIALS, v.26, no.44, pp.7521 - 7528-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/195156-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectNEAR-FIELD-
dc.subjectOPTICAL INTERFERENCE-
dc.subjectPLASMONIC MATERIALS-
dc.subjectNANOGAP ARRAYS-
dc.subjectWAVE-GUIDE-
dc.subjectLIGHT-
dc.subjectMODES-
dc.subjectMETAMATERIALS-
dc.subjectILLUMINATION-
dc.subjectRESOLUTION-
dc.titleVertically Oriented, Three-Dimensionally Tapered Deep-Subwavelength Metallic Nanohole Arrays Developed by Photofluidization Lithography-
dc.typeArticle-
dc.identifier.wosid000345514600017-
dc.identifier.scopusid2-s2.0-84918799046-
dc.type.rimsART-
dc.citation.volume26-
dc.citation.issue44-
dc.citation.beginningpage7521-
dc.citation.endingpage7528-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.201403098-
dc.contributor.localauthorPark, Jung-Ki-
dc.contributor.nonIdAuthorLee, Sol-Ah-
dc.contributor.nonIdAuthorLee, Seungwoo-
dc.type.journalArticleArticle-
dc.subject.keywordPlusNEAR-FIELD-
dc.subject.keywordPlusOPTICAL INTERFERENCE-
dc.subject.keywordPlusPLASMONIC MATERIALS-
dc.subject.keywordPlusNANOGAP ARRAYS-
dc.subject.keywordPlusWAVE-GUIDE-
dc.subject.keywordPlusLIGHT-
dc.subject.keywordPlusMODES-
dc.subject.keywordPlusMETAMATERIALS-
dc.subject.keywordPlusILLUMINATION-
dc.subject.keywordPlusRESOLUTION-
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CBE-Journal Papers(저널논문)
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