Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly

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Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase separation to produce well-organized nanostructures with periods of a few nm and above. However, the inherently three-dimensional structure of block copolymer microdomains could enable them to make 3D devices and structures directly, which could lead to efficient fabrication of complex heterogeneous structures. This article reviews recent progress in developing 3D nanofabrication processes based on block copolymers.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2014-07
Language
English
Article Type
Article
Keywords

ATOMIC-LAYER DEPOSITION; SEQUENTIAL INFILTRATION SYNTHESIS; FIELD-EFFECT TRANSISTORS; ORDERED SQUARE ARRAYS; THIN-FILMS; DIBLOCK COPOLYMERS; PHOTONIC CRYSTALS; NANOIMPRINT LITHOGRAPHY; FUNCTIONAL MATERIALS; TRIBLOCK COPOLYMERS

Citation

ADVANCED MATERIALS, v.26, no.25, pp.4386 - 4396

ISSN
0935-9648
DOI
10.1002/adma.201400386
URI
http://hdl.handle.net/10203/192375
Appears in Collection
MS-Journal Papers(저널논문)
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