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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly

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dc.contributor.authorRoss, Caroline A.ko
dc.contributor.authorBerggren, Karl K.ko
dc.contributor.authorCheng, Joy Y.ko
dc.contributor.authorJung, Yeon Sikko
dc.contributor.authorChang, Jae-Byumko
dc.date.accessioned2014-12-09T01:23:36Z-
dc.date.available2014-12-09T01:23:36Z-
dc.date.created2014-08-18-
dc.date.created2014-08-18-
dc.date.created2014-08-18-
dc.date.issued2014-07-
dc.identifier.citationADVANCED MATERIALS, v.26, no.25, pp.4386 - 4396-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/192375-
dc.description.abstractThin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase separation to produce well-organized nanostructures with periods of a few nm and above. However, the inherently three-dimensional structure of block copolymer microdomains could enable them to make 3D devices and structures directly, which could lead to efficient fabrication of complex heterogeneous structures. This article reviews recent progress in developing 3D nanofabrication processes based on block copolymers.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectATOMIC-LAYER DEPOSITION-
dc.subjectSEQUENTIAL INFILTRATION SYNTHESIS-
dc.subjectFIELD-EFFECT TRANSISTORS-
dc.subjectORDERED SQUARE ARRAYS-
dc.subjectTHIN-FILMS-
dc.subjectDIBLOCK COPOLYMERS-
dc.subjectPHOTONIC CRYSTALS-
dc.subjectNANOIMPRINT LITHOGRAPHY-
dc.subjectFUNCTIONAL MATERIALS-
dc.subjectTRIBLOCK COPOLYMERS-
dc.titleThree-Dimensional Nanofabrication by Block Copolymer Self-Assembly-
dc.typeArticle-
dc.identifier.wosid000339007000027-
dc.identifier.scopusid2-s2.0-84903730346-
dc.type.rimsART-
dc.citation.volume26-
dc.citation.issue25-
dc.citation.beginningpage4386-
dc.citation.endingpage4396-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.201400386-
dc.contributor.localauthorJung, Yeon Sik-
dc.contributor.localauthorChang, Jae-Byum-
dc.contributor.nonIdAuthorRoss, Caroline A.-
dc.contributor.nonIdAuthorBerggren, Karl K.-
dc.contributor.nonIdAuthorCheng, Joy Y.-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusATOMIC-LAYER DEPOSITION-
dc.subject.keywordPlusSEQUENTIAL INFILTRATION SYNTHESIS-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusORDERED SQUARE ARRAYS-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusDIBLOCK COPOLYMERS-
dc.subject.keywordPlusPHOTONIC CRYSTALS-
dc.subject.keywordPlusNANOIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusFUNCTIONAL MATERIALS-
dc.subject.keywordPlusTRIBLOCK COPOLYMERS-
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