Showing results 1 to 6 of 6
A study on low dielectric material deposition using a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09 |
Anomalous evolution of Ar metastable density with electron density in high density Ar discharge Park, Min; Chang, Hong-Young; You, Shin-Jae; Kim, Jung-Hyung; Shin, Yong-Hyeon, PHYSICS OF PLASMAS, v.18, no.10, 2011-10 |
Antenna configuration for uniform large-area inductively coupled plasma production Kim, SS; Chang, Hong-Young; Chang, Choong-Seock; Yoon, NS, APPLIED PHYSICS LETTERS, v.77, no.4, pp.492 - 494, 2000-07 |
Deposition and 1.54 mu m Er3+ luminescent properties of erbium-doped hydrogenated amorphous silicon thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiH4 with concurrent sputtering of erbium Shin, JungHoon; Kim, MJ, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.17, no.6, pp.3230 - 3234, 1999 |
Nonlocal electron kinetics in a planar inductive helium discharge Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11 |
Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04 |
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