Antenna configuration for uniform large-area inductively coupled plasma production

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An antenna configuration for uniform plasma generation in a large-area inductively coupled plasma (ICP) source is presented and investigated using numerical analysis. The numerical results show that a properly tuned, segmented coil system with an external variable capacitor can allow antenna voltage, currents, and plasma uniformity to be controlled in the large-area ICP source. The key element of this concept is to induce LC-resonance in the coil system by the external capacitance variation. Through the LC-resonance, not only a small antenna voltage can be obtained, but also a selected coil current near a low plasma density regime can be significantly enhanced. Self-consistent fluid simulations for Ar and Cl-2 plasmas indicate that the radial plasma spread can be optimized near the LC-resonance condition. (C) 2000 American Institute of Physics. [S0003-6951(00)04830-0].
Publisher
AMER INST PHYSICS
Issue Date
2000-07
Language
English
Article Type
Article
Keywords

GLOW-DISCHARGE; SIMULATION

Citation

APPLIED PHYSICS LETTERS, v.77, no.4, pp.492 - 494

ISSN
0003-6951
DOI
10.1063/1.127021
URI
http://hdl.handle.net/10203/76046
Appears in Collection
PH-Journal Papers(저널논문)
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