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| Chemical-Reaction-Induced Hot Electron Flows on Platinum Colloid Nanoparticles under Hydrogen Oxidation: Impact of Nanoparticle Size Lee, Hyosun; Nedrygailov, Ievgen I.; Lee, Changhwan; Somorjai, Gabor A.; Park, JeongYoung, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.54, no.8, pp.2340 - 2344, 2015-02 |
| CHEMICAL-SHIFT ARTIFACT CORRECTION SCHEME USING ECHO-TIME ENCODING TECHNIQUE CHO, ZH; NALCIOGLU, O; Park, HyunWook; Ra, Jong Beom; HILAL, SK, MAGNETIC RESONANCE IN MEDICINE, v.2, no.3, pp.253 - 261, 1985 |
| Chemical-shift selective multislice imaging using the gradient revelsal technique Park, HyunWook; Han, Yeji; Oh, ChangHyun; Lee, YooJin, International Society for Magnetic Resonance in Maedicine, ISMRM, pp.1924 -, ISMRM, 2012-05 |
| CHEMICAL-VAPOR-DEPOSITION OF HYDROGEN-PERMSELECTIVE SILICA FILMS ON POROUS-GLASS SUPPORTS FROM TETRAETHYLORTHOSILICATE HA, HY; NAM, SW; HONG, SA; Lee, Won Kook, JOURNAL OF MEMBRANE SCIENCE, v.85, no.3, pp.279 - 290, 1993-12 |
| Chemicallly Modified Carbon Nanotubes & Graphene for Energy Applications Kim, Sang Ouk, NPGT 2018 4th International Conference on Nanogenerators and Piezotronics, The Korean Institute of Electrical and Electronic Material Engineers, 2018-05-09 |
| Chemically abrupt interface between Ce oxide and Fe films Lee, HG; Lee, D; Kim, Sehun; Kim, SG; Hwang, CY, APPLIED SURFACE SCIENCE, v.252, no.5, pp.1202 - 1205, 2005-12 |
| Chemically Activated Covalent Triazine Frameworks with Enhanced Textural Properties for High Capacity Gas Storage Lee, Yoon Jeong; Talapaneni, Siddulu Naidu; Coskun, Ali, ACS Applied Materials and Interfaces, v.9, no.36, pp.30679 - 30685, 2017-09 |
| Chemically amplifed resists based on the poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) = 폴리(1,4-디옥사스피로[4.4]노난-2-메틸 메타크릴레이트)를 기본으로 하는 화학증폭형 레지스트link Park, Jong-Jin; 박종진; et al, 한국과학기술원, 1999 |
| Chemically Amplified Resist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kim, Hyun-Woo, SPIE-The International Society for Optical Engineering, pp.420 - 428, Proceedings of SPIE, 1999-01 |
| Chemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kang, Jae-Sung, 한국고분자학회 1999년 춘계 학술대회 , pp.209 - 209, 한국고분자학회, 1999 |
| Chemically Amplified Resists based on Acrylate Polymers containing Ketal Groups in the Side Chains Kim, Jin-Baek; Park, Jong-Jin; Jang, Ji-Hyun, SPIE-The International Society for Optical Engineering, pp.625 - 632, SPIE, 1999-01 |
| Chemically amplified resists based on methacrylate polymers with cholic acid derivatives Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2000년 춘계 학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |
| Chemically amplified resists based on norbornene polymer with non- outgassing acid labile protecting group Lee, Jae Jun; Lee, Kwan-Ku; Kim, Jin-Baek, 한국고분자학회 2000년도 추계 학술대회 , v.25, no.2, pp.300 - 300, 한국고분자학회, 2000-10 |
| Chemically Amplified Resists based on Poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) Kim, Jin-Baek; Park, Jong Jin, 한국고분자학회 1999년도 춘계 학술대회 연구논문초록집, pp.135 - 135, 한국고분자학회, 1999 |
| Chemically amplified resists based on poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) Kim, Jin-Baek; Park, JJ; Jang, JH, POLYMER, v.41, no.1, pp.149 - 153, 2000-01 |
| Chemically amplified resists based on the methacrylate polymers with cholic acid derivatives Kim, Jin-Baek; Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil, 한국고분자학회 2000년 춘계 학술대회, pp.42 - 42, 한국고분자학회, 2000 |
| Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives Kim, Jin-Baek; Lee, Bum-Wook; Kang, Jae-Sung, SPIE-The International Society for Optical Engineering, pp.36 - 43, SPIE, 1999-01 |
| Chemically Amplified Resists based on the Norbornene Copolymers with Steroid Derivatives Kim, Jin-Baek; Lee, Bum Wook, 한국고분자학회 1999년 춘계 학술대회, pp.66 - 66, 한국고분자학회, 1999 |
| Chemically amplified resists based on the norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group Kim, Jin-Baek; Lee, Jae Jun; Kang, Jae-Sung, Advances in Resist Technology and Processing XVII, pp.1079 - 1087, SPIE, 2000-02-28 |
| Chemically amplified resists containing vinyllactam derivatives Kim, Jin-Baek; Jung, M.-H.; Cheong, J.-H.; Kim, J.-Y.; Bok, C.-K.; Koh, C.-W.; Baik, K.-H., JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, v.10, no.3, pp.493 - 502, 1997 |
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