학위논문(박사) - 한국과학기술원 : 신소재공학과, 1999.2, [ xii, 99 p. ]
Deep-UV; Chemically amplified resist; Poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate; Dry etching resistance; 건식내에칭성; 원자외선; 화학증폭형 포토레지스트; 폴리(1,4-디옥사스피로[4.4]노난-2-메틸 메타크릴레이트)
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