An ellipsometric data acquisition method for thin film thickness measurement in real time

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A novel ellipsometric data acquisition method is introduced to measure the optical properties of a sample in real time. The experimental setup utilized a focused-beam ellipsometer integrated high numerical aperture objective lens in the normal direction to the sample surface. It is able to achieve ellipsometic data at multiple angles of incidence within a sub-mu m region of sample. Also a calibration technique is described. The experimental results for various SiO(2.) thin film samples are demonstrated.
Publisher
IOP PUBLISHING LTD
Issue Date
2008-04
Language
English
Article Type
Article
Keywords

IMAGING ELLIPSOMETRY; MICROSCOPY

Citation

MEASUREMENT SCIENCE & TECHNOLOGY, v.19

ISSN
0957-0233
DOI
10.1088/0957-0233/19/4/047002
URI
http://hdl.handle.net/10203/86969
Appears in Collection
ME-Journal Papers(저널논문)
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