전자 싸이클로트론 공명 플라즈마 화학증착법에 의한 실리콘 질화막 형성 및 특성연구On the silicon nitride film formation and characteristic study by chemical vapor deposition method using electron cyclotron resonance plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Yong-Jin Kim | ko |
| dc.contributor.author | Jung-Hyung Kim | ko |
| dc.contributor.author | Sun-Kyu Song | ko |
| dc.contributor.author | Hong-Young Chang | ko |
| dc.date.accessioned | 2013-02-25T21:33:05Z | - |
| dc.date.available | 2013-02-25T21:33:05Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1992 | - |
| dc.identifier.citation | 한국표면공학회지, v.25, no.6, pp.287 - 292 | - |
| dc.identifier.issn | 1225-8024 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/65467 | - |
| dc.language | Korean | - |
| dc.publisher | 한국표면공학회 | - |
| dc.title | 전자 싸이클로트론 공명 플라즈마 화학증착법에 의한 실리콘 질화막 형성 및 특성연구 | - |
| dc.title.alternative | On the silicon nitride film formation and characteristic study by chemical vapor deposition method using electron cyclotron resonance plasma | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 25 | - |
| dc.citation.issue | 6 | - |
| dc.citation.beginningpage | 287 | - |
| dc.citation.endingpage | 292 | - |
| dc.citation.publicationname | 한국표면공학회지 | - |
| dc.contributor.localauthor | Hong-Young Chang | - |
| dc.contributor.nonIdAuthor | Yong-Jin Kim | - |
| dc.contributor.nonIdAuthor | Jung-Hyung Kim | - |
| dc.contributor.nonIdAuthor | Sun-Kyu Song | - |
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