Polybenzoxazole/graphene nanocomposite for etching hardmask

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We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly (hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film. (C) 2019 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE INC
Issue Date
2019-07
Language
English
Article Type
Article
Citation

JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v.75, pp.296 - 303

ISSN
1226-086X
DOI
10.1016/j.jiec.2019.03.042
URI
http://hdl.handle.net/10203/262235
Appears in Collection
CBE-Journal Papers(저널논문)
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