Multiple-exposure holographic lithography with phase shift

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We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties. (C) 2004 American Institute of Physics.
Publisher
AMER INST PHYSICS
Issue Date
2004-11
Language
English
Article Type
Article
Keywords

PHOTONIC BAND-GAP; INTERFERENCE LITHOGRAPHY; FABRICATION; CRYSTALS; ARRAYS

Citation

APPLIED PHYSICS LETTERS, v.85, no.18, pp.4184 - 4186

ISSN
0003-6951
DOI
10.1063/1.1813644
URI
http://hdl.handle.net/10203/12696
Appears in Collection
CBE-Journal Papers(저널논문)
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