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College of Engineering(공과대학)Dept. of Nuclear and Quantum Engineering(원자력및양자공학과)NE-Journal Papers(저널논문)

Multiple-exposure holographic lithography with phase shift

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dc.contributor.authorMoon, JHko
dc.contributor.authorYang, Seung-Manko
dc.contributor.authorPine, DJko
dc.contributor.authorChang, WSko
dc.date.accessioned2009-11-17T01:49:32Z-
dc.date.available2009-11-17T01:49:32Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-11-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.85, no.18, pp.4184 - 4186-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/12696-
dc.description.abstractWe demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties. (C) 2004 American Institute of Physics.-
dc.description.sponsorshipThis work was supported by the “National R&D Project for Nano Science and Technology” of the Ministry of Science and Technology, Center for Nanoscale Mechatronics (M102KN010001-02K1401-00212), BK21 program, and CUPS-ERC. D.J.P. acknowledges support from the U.S. National Science Foundationen
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAMER INST PHYSICS-
dc.subjectPHOTONIC BAND-GAP-
dc.subjectINTERFERENCE LITHOGRAPHY-
dc.subjectFABRICATION-
dc.subjectCRYSTALS-
dc.subjectARRAYS-
dc.titleMultiple-exposure holographic lithography with phase shift-
dc.typeArticle-
dc.identifier.wosid000224894900076-
dc.identifier.scopusid2-s2.0-10044226235-
dc.type.rimsART-
dc.citation.volume85-
dc.citation.issue18-
dc.citation.beginningpage4184-
dc.citation.endingpage4186-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.1813644-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYang, Seung-Man-
dc.contributor.nonIdAuthorMoon, JH-
dc.contributor.nonIdAuthorPine, DJ-
dc.contributor.nonIdAuthorChang, WS-
dc.type.journalArticleArticle-
dc.subject.keywordPlusPHOTONIC BAND-GAP-
dc.subject.keywordPlusINTERFERENCE LITHOGRAPHY-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusCRYSTALS-
dc.subject.keywordPlusARRAYS-
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