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Showing results 187041 to 187060 of 275955
| Sub-20 nm ultrathin perfluorosulfonic acid-grafted graphene oxide composite membranes for vanadium redox flow batteries Lee, Jiwoo; Kim, Jongmin Q.; Ko, Hansol; Hwang, Inhyeok; Lee, Yoonki; Kim, Kihyun; So, Soonyong; et al, JOURNAL OF MEMBRANE SCIENCE, v.688, 2023-12 |
| Sub-20-Attosecond Timing Jitter Mode-Locked Fiber Lasers Kim, Hyoji; Qin, Peng; Song, Youjian; Yang, Heewon; Shin, Junho; Kim, Chur; Jung, Kwang Yun; et al, IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, v.20, no.5, 2014-09 |
| Sub-20nm CMOS FinFET Technologies Choi, Yang-Kyu; Lindert, Nick; Xuan, Peiqi; Tang, Stephen; Ha,Daewon; Anderson, Erik; King, Tsu-Jae; et al, IEEE, pp.421 - 424, IEEE, 2001-12 |
| Sub-30 nm 2D Perovskites Patterns via Block Copolymer Guided Self-Assembly for Color Conversion Optical Polarizer Park, Youjin; Han, Hyowon; Lee, Hyeokjung; Kim, Sohee; Park, Tae Hyun; Jang, Jihye; Kim, Gwanho; et al, SMALL, v.19, no.47, 2023-11 |
| Sub-30 nm Gate Template Fabrication for Nanoimprint Lithography Using Spacer Patterning Technology Park, Kun-Sik; Baik, Kyu-Ha; Kim, Dong-Pyo; Woo, Jong-Chang; No, Kwang-Soo; Lee, Ki-Jun; Do, Lee-Mi, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.11, no.2, pp.1625 - 1628, 2011-02 |
| Sub-40 fs Kerr-lens mode-locked Tm,Ho:CALGO laser Chen, Weidong; Wang, Li; Griebner, Uwe; Zhang, Ge; Loiko, Pavel; Mateos, Xavier; Bae, Ji Eun; et al, The 10th EPS-QEOD Europhoton Conference (Europhoton 2022), EPS (European Physical Society), 2022-09-02 |
| Sub-5 mu m-thick spalled single crystal Si foils by decoupling crack initiation and propagation Lee, Yong Hwan; Kim, Yong-Jae; Han, Seung Min Jane; Song, Hee-eun; Oh, Jihun, APPLIED PHYSICS LETTERS, v.109, no.13, 2016-09 |
| Sub-5 nm Dendrimer Directed Self-assembly Using HIgh Aspect Ratio Nanopatterns 박강호; 정우빈; 권기옥; Lavrentovich, Oleg D; 정희태, 2018 한국화학공학회 추계학술대회, 한국화학공학회, 2018-10-25 |
| Sub-5 nm Dendrimer Directed Self-Assembly with Large-Area Uniform Alignment by Graphoepitaxy Park, Kangho; Jung, Woo Bin; Kwon, Kiok; Lavrentovich, Oleg D.; Jung, Hee-Tae, ADVANCED FUNCTIONAL MATERIALS, v.29, no.26, 2019-06 |
| Sub-50 fs mode-locking of a Cr:YAG laser using an SWCNT-SA Cafiso, S. D. Di Dio; Ugolotti, E.; Schmidt, A.; Petrov, V.; Griebner, U.; Agnesi, A.; Cho, W. B.; et al, LASER PHYSICS LETTERS, v.10, no.8, 2013-08 |
| Sub-50 nm p-channel FinFET Huang, XJ; Lee, WC; Kuo, C; Hisamoto, D; Chang, LL; Kedzierski, J; Anderson, E; et al, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.48, no.5, pp.880 - 886, 2001-05 |
| Sub-50 nm period patterns with EUV interference lithography Solak, HH; David, C; Gobrecht, J; Golovkina, V; Cerrina, F; Kim, Sang Ouk; Nealey, PF, MICROELECTRONIC ENGINEERING, v.67-8, pp.56 - 62, 2003-06 |
| Sub-50 nm Template Fabrications for Nanoimprint Lithography Using Hydrogen Silsesquioxane and Silicon Nitride Shim, Jae-Yeob; Baek, Kyu-Ha; Park, Kun-Sik; Shin, Hong-Sik; No, Kwang-Soo; Lee, Ki-Jun; Do, Lee-Mi, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.10, pp.3628 - 3630, 2010-05 |
| Sub-50nm FinFET : PMOS Choi, Yang-Kyu; Huang, Xuejue; Lee, Wen-Chin; Kuo, Charles; Hisamoto, Digh; Chang, Leland; Kedzierski, Jakub; et al, IEDM Technical Digest, pp.67 - 70, IEEE, 1999-12 |
| Sub-5nm all-around gate FinFET for ultimate scaling Lee, H.; Yu, L.-E.; Ryu, S.-W.; Han, J.-W.; Jeon, K.; Jang, D.-Y.; Kim, K.-H.; et al, 2006 Symposium on VLSI Technology, VLSIT, pp.58 - 59, 2006-06-13 |
| Sub-5nm All-Around Gate FinFET for Ultimate Scaling Lee, Hyunjin; Yu, Lee-Eun; Ryu, Seong-Wan; Han, Jin-Woo; Jeon, Kanghoon; Jang, Dong-Yoon; Kim, Kuk-Hwan; et al, IEEE Symposium on VLSI Technology Digest of Technical Papaers, pp. 70-71, 2006-06-13 |
| Sub-60-fs Pulse Generation from a SWCNT Mode-Locked Tm:LuYO3 Ceramic Laser at 2045 nm Zhao, Yongguang; Wang, Li; Pan, Zhongben; Wang, Yicheng; Zhang, Jian; Liu, Peng; Xu, Xiaodong; et al, OSA Laser Congress (Advanced Solid State Lasers Conference), Optical Society of America (OSA), 2019-10-01 |
| Sub-60-mV / decade Negative Capacitance FinFET With Sub-10-nm Hafnium-Based Ferroelectric Capacitor Ko, Eunah; Lee, Hyunjae; Goh, Youngin; Jeon, Sanghun; Shin, Changhwan, IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, v.5, no.5, pp.306 - 309, 2017-09 |
| Sub-60-nm Extremely Thin Body InxGa1-xAs-On-Insulator MOSFETs on Si With Ni-InGaAs Metal S/D and MOS Interface Buffer Engineering and Its Scalability Kim, Sanghyeon; Yokoyama, Masafumi; Taoka, Noriyuki; Nakane, Ryosho; Yasuda, Tetsuji; Ichikawa, Osamu; Fukuhara, Noboru; et al, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.60, no.8, pp.2512 - 2517, 2013-08 |
| Sub-60-nm quasi-planar FinFETs fabricated using a simplified process Lindert, N; Chang, LL; Choi, Yang-Kyu; Anderson, EH; Lee, WC; King, TJ; Bokor, J; et al, IEEE ELECTRON DEVICE LETTERS, v.22, no.10, pp.487 - 489, 2001-10 |
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- 31,005 2020 - 2024
- 99,997 2010 - 2019
- 75,669 2000 - 2009
- 44,727 1990 - 1999
- 14,360 1980 - 1989
- 62 1964 - 1969