Electronic structure of oxygen vacancy in crystalline InGaO3(ZnO)(m)

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We perform first-principles theoretical calculations to investigate the defect properties of oxygen vacancy (V-O) in crystalline InGaO3(ZnO)(m) (m = 3). In a flat boundary structure, in which Ga atoms are located on a single plane, various configurations of V-O exist. We find that neutral V-O at a site near the In-O layer or in the ZnO area is energetically more favorable than those formed near and on the Ga-O layer. Although the defect levels vary with the type of metal ions in the neighborhood, V-O defects act as deep donors, similar to that of bulk ZnO. Moreover, the O-vacancies exhibit the negative-U behavior, with the charge transition levels well below the conduction band minimum. (C) 2009 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2009-12
Language
English
Article Type
Article; Proceedings Paper
Keywords

TRANSPARENT OXIDE SEMICONDUCTOR; AUGMENTED-WAVE METHOD; ELECTRICAL-PROPERTIES; ZINC-OXIDE; ENERGY

Citation

PHYSICA B-CONDENSED MATTER, v.404, no.23-24, pp.4794 - 4796

ISSN
0921-4526
URI
http://hdl.handle.net/10203/99912
Appears in Collection
PH-Journal Papers(저널논문)
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