DSpace at KOASAS
College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Synthesis and characterization of photopatternable epoxy hybrid materials for the fabrication of thick and thermally stable microstructures with a high aspect ratio

Cited 25 time in webofscience Cited 31 time in scopus
  • Hit : 379
  • Download : 1
Export
DC FieldValueLanguage
dc.contributor.authorJung, Kyung Hoko
dc.contributor.authorBae, Byeong-Sooko
dc.date.accessioned2009-06-23T02:11:27Z-
dc.date.available2009-06-23T02:11:27Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-06-
dc.identifier.citationJOURNAL OF APPLIED POLYMER SCIENCE, v.108, no.5, pp.3169 - 3176-
dc.identifier.issn0021-8995-
dc.identifier.urihttp://hdl.handle.net/10203/9680-
dc.description.abstractPhotosensitive cycloaliphatic-epoxy oligosiloxane was synthesized using a nonhydrolytic sol-gel reaction for the fabrication of thick and thermally stable microstructures with high aspect ratios. Its formation was confirmed by Si-29 and pH nuclear magnetic resonance spectroscopy, small-angle neutron scattering, and Fourier transform infrared spectroscopy. Photocuring of cycloaliphatic-epoxy oligosiloxane resin resulted in a thermally stable epoxy hybrid material (epoxy hybrimer). Micropatterns with a high aspect ratio (>5), an excellent sidewall shape, and low shrinkage were fabricated directly from these materials using a simple photolithographic process. The fabricated micropattern sustained temperatures of up to 250 degrees C. (C) 2008 Wiley Periodicals,-
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherWiley-Blackwell-
dc.subjectPHOTOINITIATED CATIONIC-POLYMERIZATION-
dc.subjectHARD COATINGS-
dc.subjectPHOTOPOLYMERIZATION-
dc.subjectPHOTORESIST-
dc.subjectINHIBITION-
dc.subjectMONOMERS-
dc.subjectRESINS-
dc.subjectGLASS-
dc.titleSynthesis and characterization of photopatternable epoxy hybrid materials for the fabrication of thick and thermally stable microstructures with a high aspect ratio-
dc.typeArticle-
dc.identifier.wosid000255043100051-
dc.identifier.scopusid2-s2.0-43249097642-
dc.type.rimsART-
dc.citation.volume108-
dc.citation.issue5-
dc.citation.beginningpage3169-
dc.citation.endingpage3176-
dc.citation.publicationnameJOURNAL OF APPLIED POLYMER SCIENCE-
dc.identifier.doi10.1002/app.27966-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.nonIdAuthorJung, Kyung Ho-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorlithography-
dc.subject.keywordAuthornanocomposites-
dc.subject.keywordAuthoroligomers-
dc.subject.keywordAuthorphotopolymerization-
dc.subject.keywordAuthorpolysiloxanes-
dc.subject.keywordPlusPHOTOINITIATED CATIONIC-POLYMERIZATION-
dc.subject.keywordPlusHARD COATINGS-
dc.subject.keywordPlusPHOTOPOLYMERIZATION-
dc.subject.keywordPlusPHOTORESIST-
dc.subject.keywordPlusINHIBITION-
dc.subject.keywordPlusMONOMERS-
dc.subject.keywordPlusRESINS-
dc.subject.keywordPlusGLASS-
Appears in Collection
MS-Journal Papers(저널논문)
Files in This Item
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 25 items in WoS Click to see citing articles in records_button

Display Simple Item Record

qr_code

  • mendeley

    citeulike

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.


rss_1.0 rss_2.0 atom_1.0