Templated assembly of metal nanoparticles in nanoimprinted patterns for metal nanowire fabrication

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We have developed a new method that combines nanoimprint lithography and metal nanoparticle solution processing for fabricating metal nanowires. A polymer template with nanoscale features, fabricated by nanoimprint lithography, provided physical reservoirs which were filled with a silver nanoparticle solution during the spin-coating. After the lift-off process, the defined silver nanoparticle patterns were annealed to enhance the conductivity for use as electrodes. Silver nanowire patterns (500 nm linewidth with a 300 nm gap) were fabricated without using an expensive high-vacuum system for metal deposition. This method demonstrated pattern resolution enhancement compared with ink-jet printing which inherently suffers from ink spreading on the substrate surface. By using this method, organic thin film transistors composed of the solution-processed silver source/drain electrodes with a channel length of 300 nm were fabricated and showed comparable behaviors to those with vacuum-deposited electrodes.
Publisher
IOP PUBLISHING LTD
Issue Date
2009-09
Language
English
Article Type
Article
Keywords

THIN-FILM TRANSISTORS; NM CHANNEL-LENGTH; PRINTING TECHNIQUES; LITHOGRAPHY; ELECTRONICS; TEMPERATURE; PERFORMANCE; MONOLAYER; POLYMERS; IMPRINT

Citation

NANOTECHNOLOGY, v.20, no.35

ISSN
0957-4484
DOI
10.1088/0957-4484/20/35/355302
URI
http://hdl.handle.net/10203/93436
Appears in Collection
ME-Journal Papers(저널논문)
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