Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric Penrose quasicrystal phase masks

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We describe the fabrication of unusual classes of three-dimensional (3D) nanostructures using single step, two-photon exposures of photopolymers through elastomeric phase masks with 5-fold, Penrose quasicrystalline layouts. Confocal imaging, computational studies, and 3D reconstructions reveal the essential aspects of the flow of light through these quasicrystal masks. The resulting nanostructures show interesting features, including quasicrystalline layouts in planes parallel to the sample surfaces, with completely aperiodic variations through their depths, consistent with the optics. Spectroscopic measurements of transmission and reflection provide additional insights.
Publisher
AMER CHEMICAL SOC
Issue Date
2008-08
Language
English
Article Type
Article
Keywords

PHOTONIC CRYSTALS; HOLOGRAPHIC LITHOGRAPHY; SOFT LITHOGRAPHY; HIGH-RESOLUTION; INTERFERENCE; FABRICATION; LASER

Citation

NANO LETTERS, v.8, no.8, pp.2236 - 2244

ISSN
1530-6984
DOI
10.1021/nl080841k
URI
http://hdl.handle.net/10203/91768
Appears in Collection
MS-Journal Papers(저널논문)
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