Controlling the temperature coefficient of resistance and resistivity in RuO2-TiO2 thin films by the intermixing ratios between RuO2 and TiO2

Abstract

The temperature coefficient of resistance (TCR) properties and resistivities, depending on the RuO(2) intermixing ratios for RuO(2)-TiO(2) thin films and their thermal stability in the temperature range of 200-700 degrees C, were investigated. The TCR values for the RuO(2)-TiO(2) thin films ranged from -557.17 to -54.923 ppm/K for the RuO(2) intermixing ratios ranging from 0.52 to 0.81, with resistivities remaining in the range of 2600-370 mu Omega cm. Moreover, the high structural stability and its stable oxide form of the RuO(2)-TiO(2) thin films resulted in minimal change in both TCR values and resistivities even after O(2) annealing process at 700 degrees C. (C) 2008 American Institute of Physics.