Compositional change of MgO barrier and interface in CoFeB/MgO/CoFeB tunnel junction after annealing

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dc.contributor.authorBae, JYko
dc.contributor.authorLim, WCko
dc.contributor.authorKim, HJko
dc.contributor.authorLee, Taek Dongko
dc.contributor.authorKim, KWko
dc.contributor.authorKim, TWko
dc.date.accessioned2013-03-06T13:15:40Z-
dc.date.available2013-03-06T13:15:40Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2006-04-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.99, no.8-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10203/87077-
dc.description.abstractRecent experiments have demonstrated high tunneling magnetoresistance (TMR) ratios in magnetic tunnel junctions (MTJs) with the MgO barrier. The CoFeB/MgO/CoFeB junctions showed better properties than the CoFe/MgO/CoFe junctions because the MgO layer had a good crystalline structure with (001) texture and smooth and sharp interface between CoFeB/MgO. In this work, the compositional changes in the MgO barrier and at the interface of CoFeB/MgO/CoFeB after the CoFeB crystallization were studied in annealed MTJs. X-ray photoelectron spectroscopy depth profiles were utilized for the as-deposited and 340 degrees C annealed specimens. Transmission electron microscope analyses showed that the MgO barrier had (100) texture on CoFeB in the junctions and CoFeB was crystallized in the annealed junctions. B in the bottom CoFeB layer diffused into the MgO barrier and B-oxide was formed at the interface of CoFeB/MgO/CoFeB after the CoFeB crystallization. The B behavior will be discussed. (C) 2006 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAmer Inst Physics-
dc.subjectROOM-TEMPERATURE-
dc.subjectMAGNETORESISTANCE-
dc.titleCompositional change of MgO barrier and interface in CoFeB/MgO/CoFeB tunnel junction after annealing-
dc.typeArticle-
dc.identifier.wosid000237404200817-
dc.identifier.scopusid2-s2.0-33646748374-
dc.type.rimsART-
dc.citation.volume99-
dc.citation.issue8-
dc.citation.publicationnameJOURNAL OF APPLIED PHYSICS-
dc.identifier.doi10.1063/1.2170591-
dc.contributor.localauthorLee, Taek Dong-
dc.contributor.nonIdAuthorBae, JY-
dc.contributor.nonIdAuthorLim, WC-
dc.contributor.nonIdAuthorKim, HJ-
dc.contributor.nonIdAuthorKim, KW-
dc.contributor.nonIdAuthorKim, TW-
dc.type.journalArticleArticle-
dc.subject.keywordPlusROOM-TEMPERATURE-
dc.subject.keywordPlusMAGNETORESISTANCE-
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