Three-dimensional nanofabrication with elastomeric phase masks

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This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.
Publisher
AMER CHEMICAL SOC
Issue Date
2007-11
Language
English
Article Type
Review
Keywords

2-DIMENSIONAL PHOTONIC CRYSTAL; SOFT LITHOGRAPHY; HIGH-RESOLUTION; HOLOGRAPHIC LITHOGRAPHY; QUASI-CRYSTALS; INFRARED WAVELENGTHS; IMPRINT LITHOGRAPHY; COMPOSITE STAMPS; BANDGAP CRYSTALS; WAVE-GUIDE

Citation

JOURNAL OF PHYSICAL CHEMISTRY B, v.111, no.45, pp.12945 - 12958

ISSN
1520-6106
DOI
10.1021/jp074093j
URI
http://hdl.handle.net/10203/86828
Appears in Collection
MS-Journal Papers(저널논문)
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