Existence of the CuPt-type ordering due to the surface undulation in CdxZn1-xTe epilayers grown on ZnTe buffer layers

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dc.contributor.authorLee, HSko
dc.contributor.authorLee, JeongYongko
dc.contributor.authorKim, TWko
dc.contributor.authorLee, Iko
dc.contributor.authorPark, HLko
dc.date.accessioned2013-03-06T04:41:15Z-
dc.date.available2013-03-06T04:41:15Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-06-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.95, pp.6054 - 6057-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10203/85828-
dc.description.abstractThe relationship between the CuPt-type ordering and the surface undulation in CdxZn1-xTe epitaxial layers grown on ZnTe buffer layers was investigated. The results of selected area electron diffraction pattern and transmission electron microscopy measurements showed that CuPt-type ordered structures were formed in the CdxZn1-xTe epitaxial layers. The atomic force microscopy image showed that the surface undulations were created from lattice mismatch between the CdxZn1-xTe ZnTe thin films and the GaAs substrate. The surface undulations provided the [110] steps, which enhanced the formation of CuPt-type ordering in highly strained CdxZn1-xTe epilayers. These results provide important information on the relationship between the microstructural and surface properties in lattice mismatched heteroepilayers in the CdxZn1-xTe/ZnTe system. (C) 2004 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectGAINP-
dc.subjectALLOY-
dc.titleExistence of the CuPt-type ordering due to the surface undulation in CdxZn1-xTe epilayers grown on ZnTe buffer layers-
dc.typeArticle-
dc.identifier.wosid000221657300014-
dc.identifier.scopusid2-s2.0-2942683283-
dc.type.rimsART-
dc.citation.volume95-
dc.citation.beginningpage6054-
dc.citation.endingpage6057-
dc.citation.publicationnameJOURNAL OF APPLIED PHYSICS-
dc.identifier.doi10.1063/1.1710720-
dc.contributor.localauthorLee, JeongYong-
dc.contributor.nonIdAuthorLee, HS-
dc.contributor.nonIdAuthorKim, TW-
dc.contributor.nonIdAuthorLee, I-
dc.contributor.nonIdAuthorPark, HL-
dc.type.journalArticleArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusGAINP-
dc.subject.keywordPlusALLOY-
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