Possible p-type doping with group-I elements in ZnO

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Based on first-principles calculations, we suggest a method for fabricating p-type ZnO with group-I elements such as Li and Na. With group-I dopants alone, substitutional acceptors are mostly self-compensated by interstitial donors. In ZnO codoped with H impurities, the formation of compensating interstitials is severely suppressed, and the acceptor solubility is greatly enhanced by forming H-acceptor complexes. The H atoms can be easily dissociated from these defect complexes at relatively low annealing temperatures, and thus low-resistivity p-type ZnO is achievable with dopants different from group-V elements.
Publisher
AMER PHYSICAL SOC
Issue Date
2004-09
Language
English
Article Type
Article
Keywords

ELECTRONIC-STRUCTURE CALCULATIONS; MOLECULAR-BEAM EPITAXY; THIN-FILMS; ZINC-OXIDE; DEFECTS; GAN; PSEUDOPOTENTIALS; DEPOSITION; HYDROGEN; CONDUCTION

Citation

PHYSICAL REVIEW B, v.70, no.11, pp.115210 - 115210

ISSN
1098-0121
DOI
10.1103/PhysRevB.70.115210
URI
http://hdl.handle.net/10203/82090
Appears in Collection
PH-Journal Papers(저널논문)
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