Low temperature growth of vertically aligned carbon nanotubes by thermal chemical vapor deposition

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dc.contributor.authorLee, CJko
dc.contributor.authorSon, KHko
dc.contributor.authorPark, Jko
dc.contributor.authorYoo, JEko
dc.contributor.authorHuh, Yko
dc.contributor.authorLee, JeongYongko
dc.date.accessioned2013-03-03T18:07:21Z-
dc.date.available2013-03-03T18:07:21Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2001-04-
dc.identifier.citationCHEMICAL PHYSICS LETTERS, v.338, no.2-3, pp.113 - 117-
dc.identifier.issn0009-2614-
dc.identifier.urihttp://hdl.handle.net/10203/79831-
dc.description.abstractVertically well-aligned carbon nanotubes (CNTs) are grown on Fe-deposited silicon oxide substrate at 550 degreesC by thermal chemical vapor deposition of C2H2 gas. We employed two-stage heating technique that the reactants heated at 850 degreesC in the first zone flow into the second zone maintained at 550 degreesC for CNT growth. The CNTs have bamboo structure, closed tip, and defective graphite sheets. (C) 2001 Elsevier Science B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectARRAYS-
dc.titleLow temperature growth of vertically aligned carbon nanotubes by thermal chemical vapor deposition-
dc.typeArticle-
dc.identifier.wosid000168499100006-
dc.identifier.scopusid2-s2.0-0001147210-
dc.type.rimsART-
dc.citation.volume338-
dc.citation.issue2-3-
dc.citation.beginningpage113-
dc.citation.endingpage117-
dc.citation.publicationnameCHEMICAL PHYSICS LETTERS-
dc.contributor.localauthorLee, JeongYong-
dc.contributor.nonIdAuthorLee, CJ-
dc.contributor.nonIdAuthorSon, KH-
dc.contributor.nonIdAuthorPark, J-
dc.contributor.nonIdAuthorYoo, JE-
dc.contributor.nonIdAuthorHuh, Y-
dc.type.journalArticleArticle-
dc.subject.keywordPlusARRAYS-
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