DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yoo, DC | ko |
dc.contributor.author | Lee, JeongYong | ko |
dc.contributor.author | Kim, IS | ko |
dc.contributor.author | Kim, YT | ko |
dc.date.accessioned | 2013-03-03T14:17:22Z | - |
dc.date.available | 2013-03-03T14:17:22Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2001-11 | - |
dc.identifier.citation | JOURNAL OF CRYSTAL GROWTH, v.233, no.1-2, pp.243 - 247 | - |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.uri | http://hdl.handle.net/10203/79042 | - |
dc.description.abstract | YMnO3 thin films deposited on Si (100) substrate by rf-sputtering were annealed with various conditions. YMnO3 films annealed in a furnace had a c-axis preferred orientation and the films annealed in a rapid thermal processor (RTP) had random orientations. However, cracks were observed in the highly c-axis oriented YMnO3 films. YMnO3 films annealed in the furnace showed poor ferroelectric characteristics. However, YMnO3 films annealed in the RTP showed a ferroelectric C-V hysteresis with 1.5 V memory window at 0.2 V/s sweep rate. Since the thermal expansion of a-axis is five times higher than that of c-axis in the YMnO3 thin films, the c-axis oriented thin films are expected to be easily cracked during the post-annealing process. Moreover, the rapid thermal annealing process effectively suppressed the increase of a native SiO2 thickness in the YMnO3/Si structure. (C) 2001 Published by Elsevier Science B.V. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | NONVOLATILE MEMORY DEVICES | - |
dc.subject | CANDIDATE | - |
dc.subject | GROWTH | - |
dc.title | Effects of post-annealing on the microstructure and ferroelectric properties of YMnO3 thin films on Si | - |
dc.type | Article | - |
dc.identifier.wosid | 000170986400033 | - |
dc.identifier.scopusid | 2-s2.0-0035501981 | - |
dc.type.rims | ART | - |
dc.citation.volume | 233 | - |
dc.citation.issue | 1-2 | - |
dc.citation.beginningpage | 243 | - |
dc.citation.endingpage | 247 | - |
dc.citation.publicationname | JOURNAL OF CRYSTAL GROWTH | - |
dc.contributor.localauthor | Lee, JeongYong | - |
dc.contributor.nonIdAuthor | Yoo, DC | - |
dc.contributor.nonIdAuthor | Kim, IS | - |
dc.contributor.nonIdAuthor | Kim, YT | - |
dc.type.journalArticle | Article | - |
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