DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cho, KH | ko |
dc.contributor.author | Lee, JeongYong | ko |
dc.contributor.author | Suh, EK | ko |
dc.contributor.author | Kim, KW | ko |
dc.date.accessioned | 2013-03-03T08:36:52Z | - |
dc.date.available | 2013-03-03T08:36:52Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997-01 | - |
dc.identifier.citation | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.1 - 5 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | http://hdl.handle.net/10203/77996 | - |
dc.description.abstract | We present a systematic experimental investigation on the prerequisite for D Line luminescence at the photon energies of 0.81 and 0.87eV in heat-treated carbon-lean Czochralski (CZ) silicon crystals. For examination of the influence of a transition metal on photoluminescence D lines, carbon-lean CZ silicon wafers annealed using simulated MOS thermal cycles were deliberately contaminated with Cu. The results show that the presence of specific extended defects, i.e., planar-type defects bounded by {111} planes and composed of 60 degrees-type dislocations and stacking faults in this experiment, is a prerequisite for the generation of D1 and D2 lines in heat-treated carbon-lean CZ silicon crystals, and that the diffusion of Cu into the heat-treated samples reduces the D2 line intensity significantly whereas it enhances D1 line luminescence up to a certain level of Cu contamination. | - |
dc.language | English | - |
dc.publisher | JAPAN J APPLIED PHYSICS | - |
dc.subject | THERMALLY INDUCED MICRODEFECTS | - |
dc.subject | STACKING-FAULTS | - |
dc.subject | DISLOCATIONS | - |
dc.subject | LUMINESCENCE | - |
dc.subject | MODEL | - |
dc.title | Prerequisite for photoluminescence D line spectra of heat-treated carbon-lean Czochralski silicon crystals | - |
dc.type | Article | - |
dc.identifier.wosid | A1997WG05600001 | - |
dc.identifier.scopusid | 2-s2.0-0030679202 | - |
dc.type.rims | ART | - |
dc.citation.volume | 36 | - |
dc.citation.issue | 1A | - |
dc.citation.beginningpage | 1 | - |
dc.citation.endingpage | 5 | - |
dc.citation.publicationname | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS | - |
dc.contributor.localauthor | Lee, JeongYong | - |
dc.contributor.nonIdAuthor | Cho, KH | - |
dc.contributor.nonIdAuthor | Suh, EK | - |
dc.contributor.nonIdAuthor | Kim, KW | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Czochralski silicon crystal | - |
dc.subject.keywordAuthor | photoluminescence D lines | - |
dc.subject.keywordAuthor | simulated MOS thermal cycles | - |
dc.subject.keywordAuthor | planar-type defect | - |
dc.subject.keywordAuthor | 60 degrees-type dislocation | - |
dc.subject.keywordAuthor | stacking fault | - |
dc.subject.keywordAuthor | Cu contamination | - |
dc.subject.keywordPlus | THERMALLY INDUCED MICRODEFECTS | - |
dc.subject.keywordPlus | STACKING-FAULTS | - |
dc.subject.keywordPlus | DISLOCATIONS | - |
dc.subject.keywordPlus | LUMINESCENCE | - |
dc.subject.keywordPlus | MODEL | - |
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