Prerequisite for photoluminescence D line spectra of heat-treated carbon-lean Czochralski silicon crystals

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dc.contributor.authorCho, KHko
dc.contributor.authorLee, JeongYongko
dc.contributor.authorSuh, EKko
dc.contributor.authorKim, KWko
dc.date.accessioned2013-03-03T08:36:52Z-
dc.date.available2013-03-03T08:36:52Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1997-01-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.1 - 5-
dc.identifier.issn0021-4922-
dc.identifier.urihttp://hdl.handle.net/10203/77996-
dc.description.abstractWe present a systematic experimental investigation on the prerequisite for D Line luminescence at the photon energies of 0.81 and 0.87eV in heat-treated carbon-lean Czochralski (CZ) silicon crystals. For examination of the influence of a transition metal on photoluminescence D lines, carbon-lean CZ silicon wafers annealed using simulated MOS thermal cycles were deliberately contaminated with Cu. The results show that the presence of specific extended defects, i.e., planar-type defects bounded by {111} planes and composed of 60 degrees-type dislocations and stacking faults in this experiment, is a prerequisite for the generation of D1 and D2 lines in heat-treated carbon-lean CZ silicon crystals, and that the diffusion of Cu into the heat-treated samples reduces the D2 line intensity significantly whereas it enhances D1 line luminescence up to a certain level of Cu contamination.-
dc.languageEnglish-
dc.publisherJAPAN J APPLIED PHYSICS-
dc.subjectTHERMALLY INDUCED MICRODEFECTS-
dc.subjectSTACKING-FAULTS-
dc.subjectDISLOCATIONS-
dc.subjectLUMINESCENCE-
dc.subjectMODEL-
dc.titlePrerequisite for photoluminescence D line spectra of heat-treated carbon-lean Czochralski silicon crystals-
dc.typeArticle-
dc.identifier.wosidA1997WG05600001-
dc.identifier.scopusid2-s2.0-0030679202-
dc.type.rimsART-
dc.citation.volume36-
dc.citation.issue1A-
dc.citation.beginningpage1-
dc.citation.endingpage5-
dc.citation.publicationnameJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS-
dc.contributor.localauthorLee, JeongYong-
dc.contributor.nonIdAuthorCho, KH-
dc.contributor.nonIdAuthorSuh, EK-
dc.contributor.nonIdAuthorKim, KW-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorCzochralski silicon crystal-
dc.subject.keywordAuthorphotoluminescence D lines-
dc.subject.keywordAuthorsimulated MOS thermal cycles-
dc.subject.keywordAuthorplanar-type defect-
dc.subject.keywordAuthor60 degrees-type dislocation-
dc.subject.keywordAuthorstacking fault-
dc.subject.keywordAuthorCu contamination-
dc.subject.keywordPlusTHERMALLY INDUCED MICRODEFECTS-
dc.subject.keywordPlusSTACKING-FAULTS-
dc.subject.keywordPlusDISLOCATIONS-
dc.subject.keywordPlusLUMINESCENCE-
dc.subject.keywordPlusMODEL-
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