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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Microstructure and electric properties of the PZT thin films fabricated by ECR PECVD: the effects of an interfacial layer and rapid thermal annealing

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dc.contributor.authorChung, Su Ockko
dc.contributor.authorKim, Jae Whanko
dc.contributor.authorKim, Sung Taeko
dc.contributor.authorKim, Geun Hongko
dc.contributor.authorLee, Won-Jongko
dc.date.accessioned2013-03-03T07:23:03Z-
dc.date.available2013-03-03T07:23:03Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1998-
dc.identifier.citationMATERIALS CHEMISTRY AND PHYSICS, v.53, no.1, pp.60 - 66-
dc.identifier.issn0254-0584-
dc.identifier.urihttp://hdl.handle.net/10203/77760-
dc.description.abstractPerovskite lead zirconate titanate (PZT) thin films were fabricated un Pt(70 nm)/Ti(100 nm)/SiO2/Si substrates at 470 degrees C and 500 degrees C, respectively, by electron electron resonance plasma-enhanced chemical vapor deposition using metal organic sources. A Ph-deficient interfacial layer was observed between thr PZT film and Pt substrate by cross-rational TEM. which seems to distort thr C-V hysteresis loop of the Pt/PZT/Pt capacitor. PZT thin films deposited at 500 degrees C had thinner interfacial layers and showed better electric properties than those deposited at 470 degrees C. Effects of the interfacial layer and post-heat treatment on the microstructure and electric properties of PZT thin films were investigated. (C) 1998 Elsevier Science S.A.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectPB(ZR,TI)O-3-
dc.subjectPBTIO3-
dc.subjectMOCVD-
dc.titleMicrostructure and electric properties of the PZT thin films fabricated by ECR PECVD: the effects of an interfacial layer and rapid thermal annealing-
dc.typeArticle-
dc.identifier.wosid000073023600010-
dc.identifier.scopusid2-s2.0-0032048846-
dc.type.rimsART-
dc.citation.volume53-
dc.citation.issue1-
dc.citation.beginningpage60-
dc.citation.endingpage66-
dc.citation.publicationnameMATERIALS CHEMISTRY AND PHYSICS-
dc.identifier.doi10.1016/S0254-0584(97)02063-4-
dc.contributor.localauthorLee, Won-Jong-
dc.contributor.nonIdAuthorChung, Su Ock-
dc.contributor.nonIdAuthorKim, Jae Whan-
dc.contributor.nonIdAuthorKim, Sung Tae-
dc.contributor.nonIdAuthorKim, Geun Hong-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorPZT-
dc.subject.keywordAuthorECR PECVD-
dc.subject.keywordAuthormetal organic source-
dc.subject.keywordAuthormicrostructure-
dc.subject.keywordAuthorelectric properties-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusPB(ZR,TI)O-3-
dc.subject.keywordPlusPBTIO3-
dc.subject.keywordPlusMOCVD-
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