Photosensitivity of germanium oxide and germanosilicate glass sol-gel films

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Germanium oxide and germanosilicate glass films were fabricated using a sol-gel spin coating method. The formation and photobleaching of the optical absorption band of the films in the 5-eV region were measured as a function of annealing under a reducing atmosphere and ultraviolet (UV) illumination. A greater amplitude in the 5-eV absorption band was observed with increasing annealing time due to the formation of more germanium-related oxygen vacancies in the films. Also, the photobleaching of the absorption band increased with increasing illumination time. Although the amplitude of the absorption band in 50GeO(2)-50SiO(2) glass films is greater than that in germanium oxide glass films because of higher annealing temperature, germanium oxide glass films are more photosensitive due to the greater photobleachable neutral oxygen monovacancy (NOMV) concentration than non-photobleachable neutral oxygen divacancy (NODV) concentration in the films. (C) 1999 Elsevier Science B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
1999-11
Language
English
Article Type
Article; Proceedings Paper
Keywords

OPTICAL-ABSORPTION BAND; ORIGIN

Citation

JOURNAL OF NON-CRYSTALLINE SOLIDS, v.259, pp.144 - 148

ISSN
0022-3093
URI
http://hdl.handle.net/10203/76318
Appears in Collection
MS-Journal Papers(저널논문)
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