Ferroelectric Thin films Prepared by RF Magnetron Sputtering Process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | No, Kwangsoo | ko |
| dc.date.accessioned | 2013-02-28T07:11:06Z | - |
| dc.date.available | 2013-02-28T07:11:06Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1995 | - |
| dc.identifier.citation | IVMRS | - |
| dc.identifier.uri | http://hdl.handle.net/10203/73439 | - |
| dc.language | English | - |
| dc.publisher | Materials Society Research | - |
| dc.title | Ferroelectric Thin films Prepared by RF Magnetron Sputtering Process | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.publicationname | IVMRS | - |
| dc.contributor.localauthor | No, Kwangsoo | - |
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