Intergation of platinum bottom electrode on poly-Si for ferroelectrics thin films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Ho Gi | ko |
| dc.date.accessioned | 2013-02-28T06:40:28Z | - |
| dc.date.available | 2013-02-28T06:40:28Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999-01 | - |
| dc.identifier.citation | APPLIED SURFACE SCIENCE | - |
| dc.identifier.uri | http://hdl.handle.net/10203/73302 | - |
| dc.title | Intergation of platinum bottom electrode on poly-Si for ferroelectrics thin films | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.publicationname | APPLIED SURFACE SCIENCE | - |
| dc.contributor.localauthor | Kim, Ho Gi | - |
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