Blistering Mechanism for the Crater Fromation at Ta/Si Interface by sputtering with Oxygen Ion Beam

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Publisher
American Institute of Physics
Issue Date
1998
Citation

JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, v.16, pp.2919 - 2925

ISSN
0734-2101
URI
http://hdl.handle.net/10203/71997
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