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College of Engineering(공과대학)Dept. of Nuclear and Quantum Engineering(원자력및양자공학과)NE-Journal Papers(저널논문)

Blistering Mechanism for the Crater Fromation at Ta/Si Interface by sputtering with Oxygen Ion Beam

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dc.contributor.authorkyung joong kimko
dc.contributor.authorJung, Kyung Hoonko
dc.contributor.authoril cheol jeonko
dc.contributor.authordae won moonko
dc.date.accessioned2013-02-28T01:21:08Z-
dc.date.available2013-02-28T01:21:08Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1998-
dc.identifier.citationJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, v.16, pp.2919 - 2925-
dc.identifier.issn0734-2101-
dc.identifier.urihttp://hdl.handle.net/10203/71997-
dc.publisherAmerican Institute of Physics-
dc.titleBlistering Mechanism for the Crater Fromation at Ta/Si Interface by sputtering with Oxygen Ion Beam-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume16-
dc.citation.beginningpage2919-
dc.citation.endingpage2925-
dc.citation.publicationnameJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A-
dc.contributor.nonIdAuthorkyung joong kim-
dc.contributor.nonIdAuthoril cheol jeon-
dc.contributor.nonIdAuthordae won moon-
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