Evolution of Residual Stress in Plasma-Enhanced Chemical-Vapor-Deposited Silicon Dioxide Film Exposed to Room Air

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dc.contributor.authoryoung-soo parkko
dc.contributor.authorjune key leeko
dc.contributor.authorilsub jungko
dc.contributor.authorsoo-bong heoko
dc.contributor.authorLee, Jai Youngko
dc.date.accessioned2013-02-27T23:13:53Z-
dc.date.available2013-02-27T23:13:53Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1999-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.75, no.24, pp.3811 - 3813-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/71416-
dc.description.abstractConsiderable increase in compressive stress was observed in silicon dioxide films upon prolonged exposure to atmospheric moisture. The compressive stress change upon exposure to atmosphere consisted of a reversible change and an irreversible change. The irreversible component was found to be due to structural changes in the Si-O-Si network. The reversible change in stress is due to water molecules absorbed on walls of the pores. (C) 1999 American Institute of Physics. [S0003-6951(99)01348-0].-
dc.languageEnglish-
dc.publisherAmer Inst Physics-
dc.subjectOXIDE FILMS-
dc.subjectDESORPTION-
dc.subjectBEHAVIOR-
dc.subjectKINETICS-
dc.subjectWATER-
dc.titleEvolution of Residual Stress in Plasma-Enhanced Chemical-Vapor-Deposited Silicon Dioxide Film Exposed to Room Air-
dc.typeArticle-
dc.identifier.wosid000084242600025-
dc.identifier.scopusid2-s2.0-0000521772-
dc.type.rimsART-
dc.citation.volume75-
dc.citation.issue24-
dc.citation.beginningpage3811-
dc.citation.endingpage3813-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.125464-
dc.contributor.nonIdAuthoryoung-soo park-
dc.contributor.nonIdAuthorjune key lee-
dc.contributor.nonIdAuthorilsub jung-
dc.contributor.nonIdAuthorsoo-bong heo-
dc.type.journalArticleArticle-
dc.subject.keywordPlusOXIDE FILMS-
dc.subject.keywordPlusDESORPTION-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordPlusKINETICS-
dc.subject.keywordPlusWATER-
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