Electrical characterization of PLT thin films by LP-MOCVD

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dc.contributor.authorLee, SSko
dc.contributor.authorKim, Ho-Giko
dc.date.accessioned2013-02-27T20:11:36Z-
dc.date.available2013-02-27T20:11:36Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1995-11-
dc.identifier.citationINTEGRATED FERROELECTRICS, v.11, no.1-4, pp.137 - 144-
dc.identifier.issn1058-4587-
dc.identifier.urihttp://hdl.handle.net/10203/70580-
dc.description.abstractLa-modified lead titanate(PLT) thin films were prepared on Pt/SiO2/Si substrate by hot-wall type low pressure-metalorganic chemical vapor deposition(LP-MOCVD). The films were deposited at 500°C under the low pressure of 1000mTorr. The films were annealed at 650°C for 10min with O2 ambient before top-Pt electroding. Schottky emission was observed for Pt/PLT(12)/Pt capacitor. With increasing La mole%, surface morphologies of the PLT films were improved smoothly and leakage current density decreased.-
dc.languageEnglish-
dc.publisherGORDON BREACH SCI PUBL LTD-
dc.titleElectrical characterization of PLT thin films by LP-MOCVD-
dc.typeArticle-
dc.identifier.wosidA1995TY23800014-
dc.type.rimsART-
dc.citation.volume11-
dc.citation.issue1-4-
dc.citation.beginningpage137-
dc.citation.endingpage144-
dc.citation.publicationnameINTEGRATED FERROELECTRICS-
dc.identifier.doi10.1080/10584589508013586-
dc.contributor.localauthorKim, Ho-Gi-
dc.contributor.nonIdAuthorLee, SS-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle; Proceedings Paper-
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