Cycle-CVD 법으로 증착된 TiN 박막의 ALD 증착기구와 특성에 관한 연구A Study on the Atomic-Layer Deposition Mechanism and Characteristics of TiN Films Deposited by Cycle-CVD
- Publisher
- 한국재료학회
- Issue Date
- 1998-01
- Language
- Korean
- Citation
한국재료학회지, v.8, no.5, pp.377 - 382
- ISSN
- 1225-0562
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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