Browse "College of Engineering(공과대학)" by Subject Extreme-Ultraviolet (EUV) lithography▼aGradient▼aStochastic effect▼aBlock copolymer▼aSelf-assembly▼aPoly (styrene)▼aPoly (pentafluorostyrene)▼a4-(tert-butyldimethylsilyloxy)-styrene▼avertical lamella▼aaspect ratio
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| Improving aspect ratio for extreme ultraviolet (EUV) pattern via encapsulating Si-containing gradient block copolymer = 실리콘 블록이 함유된 농도구배를 갖는 블록공중합체의 자기조립 현상을 이용한 극 자외선 패턴의 종횡비 개선 연구link Park, Yemin; Jung, Yeon Sik; et al, 한국과학기술원, 2021 |
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