Browse "College of Engineering(공과대학)" by Subject Extreme-Ultraviolet (EUV) lithography▼aGradient▼aStochastic effect▼aBlock copolymer▼aSelf-assembly▼aPoly (styrene)▼aPoly (pentafluorostyrene)▼a4-(tert-butyldimethylsilyloxy)-styrene▼avertical lamella▼aaspect ratio
Showing results 1 to 1 of 1
| Improving aspect ratio for extreme ultraviolet (EUV) pattern via encapsulating Si-containing gradient block copolymer = 실리콘 블록이 함유된 농도구배를 갖는 블록공중합체의 자기조립 현상을 이용한 극 자외선 패턴의 종횡비 개선 연구link Park, Yemin; Jung, Yeon Sik; et al, 한국과학기술원, 2021 |
Discover
Open Access
Date issued
- 23,569 2020 - 2024
- 75,407 2010 - 2019
- 57,252 2000 - 2009
- 30,842 1990 - 1999
- 9,025 1980 - 1989