급속열처리와 엑시머 레이저에 의해 형성된 다결정 실리콘 박막에서 열처리 방법에 따른 박막의 특성변화Comparison of the Characteristics of Polycrystalline Silicon Thin Films Between Rapid Thermal Annealing and laser Annealing Methods

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dc.contributor.author이창우ko
dc.contributor.author고민경ko
dc.contributor.author우상록ko
dc.contributor.author고석중ko
dc.contributor.author이정용ko
dc.contributor.author최광렬ko
dc.contributor.author최영석ko
dc.date.accessioned2013-02-27T17:13:50Z-
dc.date.available2013-02-27T17:13:50Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1997-
dc.identifier.citation한국재료학회지, v.7, no.10, pp.908 - 913-
dc.identifier.issn1225-0562-
dc.identifier.urihttp://hdl.handle.net/10203/69775-
dc.languageKorean-
dc.publisher한국재료학회-
dc.title급속열처리와 엑시머 레이저에 의해 형성된 다결정 실리콘 박막에서 열처리 방법에 따른 박막의 특성변화-
dc.title.alternativeComparison of the Characteristics of Polycrystalline Silicon Thin Films Between Rapid Thermal Annealing and laser Annealing Methods-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume7-
dc.citation.issue10-
dc.citation.beginningpage908-
dc.citation.endingpage913-
dc.citation.publicationname한국재료학회지-
dc.contributor.localauthor이정용-
dc.contributor.nonIdAuthor이창우-
dc.contributor.nonIdAuthor고민경-
dc.contributor.nonIdAuthor우상록-
dc.contributor.nonIdAuthor고석중-
dc.contributor.nonIdAuthor최광렬-
dc.contributor.nonIdAuthor최영석-
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