Effects of sulphate ion additives on the pitting corrosion of pure aluminium in 0.01 M NaCl solution

Cited 107 time in webofscience Cited 115 time in scopus
  • Hit : 544
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorLee, WJko
dc.contributor.authorPyun, Su Ilko
dc.date.accessioned2013-02-27T16:42:54Z-
dc.date.available2013-02-27T16:42:54Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2000-
dc.identifier.citationELECTROCHIMICA ACTA, v.45, no.12, pp.1901 - 1910-
dc.identifier.issn0013-4686-
dc.identifier.urihttp://hdl.handle.net/10203/69655-
dc.description.abstractEffects of sulphate (SO42-) ion additives on the pitting corrosion of pure aluminium (Al) have been investigated in aqueous 0.01 M NaCl solution as a function of SO42- ion concentration using potentiodynamic polarisation experiment, ac impedance spectroscopy, electrochemical quartz crystal microbalance technique and abrading electrode technique. The addition of SO42- ions to NaCl solution raised the pitting potential (E-pit) of pure Al in value and simultaneously the anodic current density at potentials much higher than the E-pit on the polarisation curves. This implies that SO42- ions impede the initiation of pit on pure Al surface below the E-pit, but enhance the growth of pre-existing pits, which is validated by optical microscopy, It was found that the values of the Cl- ion-incorporated outer film resistance R-out,R-ox in SO42- ion-containing chloride solutions were much lower than those in SO42- ion-free solution, obtained from the impedance spectra measured at potentials below the E-pit. The chloride peak disappeared from the Auger spectra in SO42- ion-containing solutions. The mass decay rate and pit growth rate b were observed to increase in values once the pits were formed in SO42- ion-containing chloride solutions. Based upon the above experimental results, it is suggested that SO42- ions retard the oxide film breakdown by Cl- ion incorporation into the film, while they accelerate the Al metal dissolution through the instantaneous formation of tunnels at the bottom of the pre-existing pits after the exposure of bare surface above the E-pit. (C) 2000 Elsevier Science Ltd. All rights reserved.-
dc.languageEnglish-
dc.publisherPERGAMON-ELSEVIER SCIENCE LTD-
dc.subjectPIT INITIATION-
dc.subjectAC-IMPEDANCE-
dc.subjectINHIBITION-
dc.subjectCOPPER-
dc.subjectKINETICS-
dc.subjectSULFATE-
dc.subjectOXIDE-
dc.subjectFILMS-
dc.titleEffects of sulphate ion additives on the pitting corrosion of pure aluminium in 0.01 M NaCl solution-
dc.typeArticle-
dc.identifier.wosid000085608100005-
dc.type.rimsART-
dc.citation.volume45-
dc.citation.issue12-
dc.citation.beginningpage1901-
dc.citation.endingpage1910-
dc.citation.publicationnameELECTROCHIMICA ACTA-
dc.identifier.doi10.1016/S0013-4686(99)00418-1-
dc.contributor.nonIdAuthorLee, WJ-
dc.type.journalArticleArticle-
dc.subject.keywordAuthoraluminium-
dc.subject.keywordAuthorsulphate ion-
dc.subject.keywordAuthorCl- ion incorporation-
dc.subject.keywordAuthorAc impedance spectroscopy-
dc.subject.keywordAuthorelectrochemical quartz crystal microbalance-
dc.subject.keywordPlusPIT INITIATION-
dc.subject.keywordPlusAC-IMPEDANCE-
dc.subject.keywordPlusINHIBITION-
dc.subject.keywordPlusCOPPER-
dc.subject.keywordPlusKINETICS-
dc.subject.keywordPlusSULFATE-
dc.subject.keywordPlusOXIDE-
dc.subject.keywordPlusFILMS-
Appears in Collection
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 107 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0