The electronic structures of epitaxial CrSi2 film prepared on Si(111) substrate

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The valence band (VB) electronic structures of CrSi2 were studied by synchrotron radiation photoemission. Overall features of the VB photoemission spectra measured at room temperature (RT) and 20 K by using synchrotron radiation. (photon energy, h nu = 20-130 eV) were similar. Two characteristic emissions were observed corresponding to the bonding and the nonbonding Cr-d partial density of states (PDOS) in the CrSi2. The onset of the VB photoemission measured at 20 K was located at about 0.32 eV below Fermi level, due to the energy band gap of CrSi2 more than 0.32 eV, (C) 1999 Elsevier Science B.V, All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
1999-08
Language
English
Article Type
Article
Keywords

THIN-FILMS; SI-CR; SILICIDES; GROWTH; DISILICIDES; GAP

Citation

APPLIED SURFACE SCIENCE, v.150, no.1-4, pp.8 - 12

ISSN
0169-4332
URI
http://hdl.handle.net/10203/68681
Appears in Collection
MS-Journal Papers(저널논문)
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