DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, KH | ko |
dc.contributor.author | Lee, JD | ko |
dc.contributor.author | Lee, JJ | ko |
dc.contributor.author | Choi, CK | ko |
dc.contributor.author | Lee, JeongYong | ko |
dc.contributor.author | Lee, YP | ko |
dc.date.accessioned | 2013-02-27T11:44:43Z | - |
dc.date.available | 2013-02-27T11:44:43Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1998-07 | - |
dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.33, no.1, pp.71 - 75 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | http://hdl.handle.net/10203/68352 | - |
dc.description.abstract | About a 290-Angstrom-thick CrSi2 film was epitaxially grown on a Si(lll) substrate by Cr deposition on a Si(lll)-7x7 substrate at similar to 450 degrees C followed by en situ annealing at similar to 1000 degrees C for 10 min. X-ray diffraction and transmission electron microscopy showed that the CrSi2(001) plane grew parallel to the Si(lll) plane with a CrSi2[210]parallel to Si[110] matching face relationship. CrSi2 is a p-type degenerate semiconductor. The electrical resistivity at room temperature was similar to 5 x 10(-3) Omega cm, and the energy band gap deduced from the temperature dependence of resistivity was similar to 0.3 eV. | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.subject | THIN-FILMS | - |
dc.subject | HETEROEPITAXIAL GROWTH | - |
dc.subject | SILICIDES | - |
dc.subject | SILICON | - |
dc.title | Growth and the electrical properties of epitaxial CrSi2 films prepared on Si(111) substrates | - |
dc.type | Article | - |
dc.identifier.wosid | 000074932100012 | - |
dc.identifier.scopusid | 2-s2.0-0032398806 | - |
dc.type.rims | ART | - |
dc.citation.volume | 33 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 71 | - |
dc.citation.endingpage | 75 | - |
dc.citation.publicationname | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.contributor.localauthor | Lee, JeongYong | - |
dc.contributor.nonIdAuthor | Kim, KH | - |
dc.contributor.nonIdAuthor | Lee, JD | - |
dc.contributor.nonIdAuthor | Lee, JJ | - |
dc.contributor.nonIdAuthor | Choi, CK | - |
dc.contributor.nonIdAuthor | Lee, YP | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | HETEROEPITAXIAL GROWTH | - |
dc.subject.keywordPlus | SILICIDES | - |
dc.subject.keywordPlus | SILICON | - |
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