DC Field | Value | Language |
---|---|---|
dc.contributor.author | YOON, YS | ko |
dc.contributor.author | KANG, WN | ko |
dc.contributor.author | YOM, SS | ko |
dc.contributor.author | KIM, TW | ko |
dc.contributor.author | JUNG, M | ko |
dc.contributor.author | PARK, TH | ko |
dc.contributor.author | SEO, KY | ko |
dc.contributor.author | Lee, JeongYong | ko |
dc.date.accessioned | 2013-02-27T08:03:55Z | - |
dc.date.available | 2013-02-27T08:03:55Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1994-01 | - |
dc.identifier.citation | THIN SOLID FILMS, v.238, no.1, pp.12 - 14 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/10203/67378 | - |
dc.description.abstract | Metal-organic chemical vapor deposition of TiO2 via pyrolysis using Ti (OC3H7)4 and N2O was investigated with the goal of producing TiO2 epitaxial films on p-Si(100) substrates. X-ray diffraction analysis showed that the grown TiO2 layer was a polycrystalline film. Auger depth profiles demonstrated that the TiO2/Si interface was relatively abrupt, and transmission electron microscopy verified the formation of an interfacial layer in the TiO2/Si interface and the formation of a polycrystalline TiO2 thin film. These results indicate that the failure to form the TiO2 epitaxial films originated from the formation of an interfacial amorphous layer at the initial growth stage. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA LAUSANNE | - |
dc.subject | TIO2 FILMS | - |
dc.subject | TA2O5 FILMS | - |
dc.subject | THIN-FILMS | - |
dc.subject | SILICON | - |
dc.subject | SURFACE | - |
dc.title | STRUCTURAL-PROPERTIES OF TITANIUM-DIOXIDE FILMS GROWN ON P-SI BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION AT LOW-TEMPERATURE | - |
dc.type | Article | - |
dc.identifier.wosid | A1994MR73200004 | - |
dc.type.rims | ART | - |
dc.citation.volume | 238 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 12 | - |
dc.citation.endingpage | 14 | - |
dc.citation.publicationname | THIN SOLID FILMS | - |
dc.contributor.localauthor | Lee, JeongYong | - |
dc.contributor.nonIdAuthor | YOON, YS | - |
dc.contributor.nonIdAuthor | KANG, WN | - |
dc.contributor.nonIdAuthor | YOM, SS | - |
dc.contributor.nonIdAuthor | KIM, TW | - |
dc.contributor.nonIdAuthor | JUNG, M | - |
dc.contributor.nonIdAuthor | PARK, TH | - |
dc.contributor.nonIdAuthor | SEO, KY | - |
dc.type.journalArticle | Letter | - |
dc.subject.keywordPlus | TIO2 FILMS | - |
dc.subject.keywordPlus | TA2O5 FILMS | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | SURFACE | - |
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