Fabrication of 3D Microstructures with single UV Lithography Step
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Han, Man Hee | ko |
| dc.contributor.author | Lee, Woon Seob | ko |
| dc.contributor.author | Lee, Sung-Keun | ko |
| dc.contributor.author | Lee, Seung Seob | ko |
| dc.date.accessioned | 2008-07-28T09:02:05Z | - |
| dc.date.available | 2008-07-28T09:02:05Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2002 | - |
| dc.identifier.citation | JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v.2, no.4, pp.268 - 272 | - |
| dc.identifier.issn | 1598-1657 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/6601 | - |
| dc.description.abstract | This paper presents a novel microfabrication technology of 3D microstructures with inclined/rotated UV lithography using negative photoresist, SU-8. In some cases, reflected UV as well as incident UV is used to form microstructures.Various 3D microstructures are simply fabricated such as embedded channels, bridges, V-grooves, truncated cones, and so on. | - |
| dc.language | English | - |
| dc.language.iso | en_US | en |
| dc.publisher | IEEK PUBLICATION CENTER | - |
| dc.title | Fabrication of 3D Microstructures with single UV Lithography Step | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 2 | - |
| dc.citation.issue | 4 | - |
| dc.citation.beginningpage | 268 | - |
| dc.citation.endingpage | 272 | - |
| dc.citation.publicationname | JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE | - |
| dc.embargo.liftdate | 9999-12-31 | - |
| dc.embargo.terms | 9999-12-31 | - |
| dc.contributor.localauthor | Lee, Seung Seob | - |
| dc.contributor.nonIdAuthor | Han, Man Hee | - |
| dc.contributor.nonIdAuthor | Lee, Woon Seob | - |
| dc.contributor.nonIdAuthor | Lee, Sung-Keun | - |
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