DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeon, DukYoung | ko |
dc.contributor.author | TENNANT, DM | ko |
dc.contributor.author | KIM, YO | ko |
dc.contributor.author | YAN, RH | ko |
dc.contributor.author | LEE, KF | ko |
dc.contributor.author | EARLY, K | ko |
dc.date.accessioned | 2013-02-25T21:34:48Z | - |
dc.date.available | 2013-02-25T21:34:48Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1992 | - |
dc.identifier.citation | JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.10, no.6, pp.2922 - 2926 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/65477 | - |
dc.description.abstract | The gate definition performed on a vertical doping engineered metal-oxide semiconductor field effect transistor is described. The fabricated gates were as narrow as 0.15 mum. For writing narrow gates, e-beam lithography and a chemically amplified negative resist SAL603 were used. The alignment between the gate level and underlying Nikon-printed levels was made using 0.8 mum deep trenched marks. The gate patterning was done with reactive ion etching (RIE) in CHF3 gas to etch a nitride layer which serves as a gate etch mask and subsequently in a Cl2 gas used to etch the polysilicon gate. A sidewall spacer was formed with a two step etch using CF4 RIE and CHF3 RIE after deposition of a 2000 angstrom TEOS film. After metallization the n-channel devices have measured excellent device characteristics, | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | DESIGN | - |
dc.title | GATE TECHNOLOGY FOR 89 GHZ VERTICAL DOPING ENGINEERED SI METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR | - |
dc.type | Article | - |
dc.identifier.wosid | A1992KM50000113 | - |
dc.type.rims | ART | - |
dc.citation.volume | 10 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 2922 | - |
dc.citation.endingpage | 2926 | - |
dc.citation.publicationname | JOURNAL OF VACUUM SCIENCE TECHNOLOGY B | - |
dc.identifier.doi | 10.1116/1.586336 | - |
dc.contributor.localauthor | Jeon, DukYoung | - |
dc.contributor.nonIdAuthor | TENNANT, DM | - |
dc.contributor.nonIdAuthor | KIM, YO | - |
dc.contributor.nonIdAuthor | YAN, RH | - |
dc.contributor.nonIdAuthor | LEE, KF | - |
dc.contributor.nonIdAuthor | EARLY, K | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordPlus | DESIGN | - |
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