DC Field | Value | Language |
---|---|---|
dc.contributor.author | Young Sung Ghim | ko |
dc.contributor.author | Ho Nam Chang | ko |
dc.date.accessioned | 2013-02-25T14:54:42Z | - |
dc.date.available | 2013-02-25T14:54:42Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1985 | - |
dc.identifier.citation | 한국화학공학회지 (JOURNAL OF THE KOREAN INSTITUTE OF CHEMICAL ENGINEERS), v.23, no.2, pp.103 - 108 | - |
dc.identifier.issn | 0256-1107 | - |
dc.identifier.uri | http://hdl.handle.net/10203/63012 | - |
dc.language | Korean | - |
dc.publisher | 한국화학공학회 | - |
dc.title | Free Surface Conditions for Steady Film Flows. | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 23 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 103 | - |
dc.citation.endingpage | 108 | - |
dc.citation.publicationname | 한국화학공학회지 (JOURNAL OF THE KOREAN INSTITUTE OF CHEMICAL ENGINEERS) | - |
dc.contributor.localauthor | Ho Nam Chang | - |
dc.contributor.nonIdAuthor | Young Sung Ghim | - |
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