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Showing results 1 to 7 of 7

1
Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching

Seo, SH; Kim, JH; Lee, PW; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical Society, 1995

2
Electron temperature control with grid in inductively coupled Ar plasma

Hong, IH; Seo, SH; Chang, Hong-Young, 43th International symp.American Vac. Soc, American Vacuum Society, 1996

3
Measurement of Ion Energy Distribution in Dual Frequency Capacitively Coupled Plasma

Chang, Hong-Young; Seo, SH; Lee, HS; Lee, JB, AVS 54th International Symposium & Exhibition, AVS, 2007

4
Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant

Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical society, 1995

5
Real Time Intrusive Optical emission spectroscopy for process control

Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995

6
Study of Helicon Wave Plasma Production and Its Characteristics

Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994

7
The deposition of SiOF film with low dielectric constant in a helicon plasma source

Kim, JH; Seo, SH; Yun, SM; Lee, KM; Choi, CK; Chang, Hong-Young, 3rd Asia-Pacific Conference on Plasma Science & Technology, Plasma Science & Technology, 1996

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